Abstract

• The investigations of structural, optical and electrical properties of nO/ITO thin films have been presented. The nO nanocrystalline thin films were prepared by Chemical Bath Deposition method. inc chloride and sodium hydroxide (NaOH) were used as precursor materials. Thin films of nO were deposited onto ITO (indium tin oxide) substrate post annealed temperature at 300C, 400C in the muffle furnance. X-ray diffraction (XRD) of the nO films showed hexagonal structure. Debye Scherrer equation was used to calculate crystallite size. Scanning electron microscopy (SEM) study provides better topographic feature of the sample surface. The optical band gap was analyzed by absorption spectra of nO.1/C2 – V properties of nO thin films were determined from C-V measurement. The photovoltaic properties of these films were investigated by current density-voltage characteristic. The photoconversion efficiency was influenced by the open-circuit voltage.