Abstract

• Transparent semiconducting thin films of titanium dioxide (TiO2) were deposited on silicon substrate by the spray method. The microstructure of the TiO2 films were characterized by X-ray diffraction (XRD), Fourier Transform Infrared Spectroscopy (FTIR) and Raman Spectroscopy. The XRD analysis revealed that the films were polycrystalline with an anatase crystal structure and a preferred grain orientation in the (101) direction. Strong LO-phonon Raman spectra modes especially B1g (393.29 cm-1 ) and Eg (634.84 cm-1 ) in Raman spectra and the absorption peak at 739 cm-1 in absorbance spectra by FTIR also indicated the existence of anatase phase TiO2 in these films.